Wet Processing
NNF Staff Contact : Jeff Hagler
Standard Processes
Samples for Most Process Tanks : Pieces – 6″ Wafers
RCA SC1/SC2 : Heated Process at 75C
BOE Oxide Etch 10:1 w/o surfactant
Photo Strip
Acid Solution : Nanostrip
Solent Solution : NMP Room Temp or Heated Process
Nitride Etch : Heated Process at 180C
Al Etch : Room Temp or Heated Process up to 60C
Ti Etch (HF Based Solution)
Poly Etch
Deglaze Process (HF Based Solution)
KOH Silicon Etch (40% Concentration) : Heated Process at 80C
Piranah Solution : Room Temperature Solution Only
Stocked Chemicals
Acids
Hydrochloric Acid HCl
Buffered Oxide Etch BOE 10:1
Hydrofluoric Acid HF 49%
Acetic Acid, Glacial CH3COOH
Sulfuric Acid 96% H2SO4
Nitric Acid HNO3
BD Etchant – Transene Co
Aluminum Etch Type A – Transene Co
Transetch N – Transene Co
Titanium Etchant TFT – Transene Co
Nanostrip – Cyantek
Base/Caustics
Ammonium Fluoride 40% NH4F
Hydrogen Peroxide 30% H2O2
Ammonium Hydroxide 29% NH4OH
Solvents
NMP CH3N(CH2)3CO
Acetone
Isopropyl Alcohol
Methanol
Photolithography Chemicals
Hexamethyldisilazane (HMDS)
LOR 3A
PMMA
SPR1813
SPR220 (3.0)
SPR955 (0.9)
5510
SU-8 2002
MF319
CD-26 (MF300 Equivalent)
PGMEA
MIBK:IPA
SU8 Developer