Physical Vapor Deposition

NNF Staff Contacts : Nicole Hedges and Jeff Ricker-Hagler

Thermionics Ebeam Evaporation

Samples : 7 – 4″ Wafers or Equivalent Area

Approved Materials: Ti, Cr, Al, Ni, Cu, Au

2.2cc crucibles, 8 pocket rotary holder

Base Pressure ~ 2e-7 Torr; Pump Time ~ 2 hours to low e-6 Torr

 

6″ Ebeam Evaporator

Samples : 1 – 6″ Wafer or Equivalent Area

Approved Materials: Ti, Cr, Al, Ni, Cu, Au, Pt

7cc crucibles, 4 pocket rotary holder

Base Pressure ~ 1e-7 Torr; Pump Time ~ 2 hours

 

 

Cleanroom Resistive Heated Evaporator

Samples :

Rotational Holder ~ 15-4″ Wafers or Equivalent Area

Liftoff Holder ~ 6-4″ Wafers or Equivalent Area

Approved Materials: Ti, Cr, Al, Cu, Ni, Au

Available Boat : Tungsten

Base Pressure ~ 1.3e-6 Torr; Pump Time ~ 5 Hours

 

 

Glovebox Resistive Heated Evaporator

Samples : 1 – 6″ Wafer or Equivalent Area

Approved Materials: Al, Ti, Ni, Mg, LiF

Available Boat : Tungsten

Base Pressure ~ Barr

 

 

DC Sputter

Sample Sizes: 4 – 6″ wafers or equivalent area

Available Targets: Ti, Cr, W, Al, Cu, Au, and Pt

Base Pressure ~ 1.2e-6 Torr; Pump Time ~ 4-5 Hours

Operation Gas Flow ~ 50mT Argon